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Product Image-76439-562

Silicon Nitride Microporous TEM Window Grid, perform well under harsh conditions, Silicon frames are 100um thick, Grids fit 3mm holders and most double tilt holders, In clear gel-boxes, Recommended use: Suspensions and cryo-EM suspension, Window dimension: 500um square, SiN: 20nm

Description: Silicon Nitride Microporous TEM Window Grid, perform well under harsh conditions, Silicon frames are 100um thick, Grids fit 3mm holders and most double tilt holders, In clear gel-boxes, Recommended use: Suspensions and cryo-EM suspension, Window dimension: 500um square, SiN: 20nm
Catalog Number: 76439-562
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-564

Silicon Nitride Microporous TEM Window Grid, perform well under harsh conditions, Silicon frames are 100um thick, Grids fit 3mm holders and most double tilt holders, In clear gel-boxes, Recommended use: Suspensions and cryo-EM suspension, Window dimension: 500um square, SiN: 50nm

Description: Silicon Nitride Microporous TEM Window Grid, perform well under harsh conditions, Silicon frames are 100um thick, Grids fit 3mm holders and most double tilt holders, In clear gel-boxes, Recommended use: Suspensions and cryo-EM suspension, Window dimension: 500um square, SiN: 50nm
Catalog Number: 76439-564
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-484

Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm

Description: Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm
Catalog Number: 76439-484
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-444

Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm

Description: Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm
Catalog Number: 76439-444
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-486

Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm

Description: Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm
Catalog Number: 76439-486
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-482

Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm

Description: Graphene on Silicon Nitride, 6-8 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 78.5-83.2%, Thickness of Graphene: 2.1-2.8nm
Catalog Number: 76439-482
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-440

Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm

Description: Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm
Catalog Number: 76439-440
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-442

Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm

Description: Graphene on Silicon Nitride, 3-5 Layers, deposited on silicon nitride TEMgrid, substrate is 200um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, support film 200nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 85.8-90.4%, Thickness of Graphene: 1.0-1.7nm
Catalog Number: 76439-442
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-380

Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35nm

Description: Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35nm
Catalog Number: 76439-380
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-378

Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35nm

Description: Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35nm
Catalog Number: 76439-378
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-420

Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm

Description: Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm
Catalog Number: 76439-420
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-422

Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm

Description: Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm
Catalog Number: 76439-422
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-376

Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35 nm

Description: Graphene on Silicon Nitride, 1 layer, deposited on silicon nitride TEM grids, substrate is 200 um thick 3mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film is 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 96.4%, Thickness of the Graphene: 0.35 nm
Catalog Number: 76439-376
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-76439-418

Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm

Description: Graphene on Silicon Nitride, 2 layers, deposited on silicon nitride TEM grids, substrate is 200 um thick 3.0mm hexagonal silicon with 0.5x0.5 mm aperture, supoort film 200 nm thick silicon nitride membrane with approximately 6,400 2.5 um holes, Transparency: 92.7%, Thickness of the Graphene: 0.7 nm
Catalog Number: 76439-418
Supplier: ELECTRON MICROSCOPY SCIENCE
Product Image-CA28306-175

VWR* Filter Paper Grade 454 18.5cm

Description: VWR* Filter Paper, Grade 454, Quantitative, Diameter: 18.5cm, Porosity: Medium, Particle retention: 10um, Flow rate: Medium Fast, For retention of zirconium hydroxide, aluminum hydroxide, cobalt sulfide, and other coarse or gelatinous precipitates
Catalog Number: CA28306-175
Supplier: VWR International

Certificates


Product Image-CA28306-153

VWR* Filter Paper Grade 454 15cm

Description: VWR* Filter Paper, Grade 454, Quantitative, Diameter: 15.0cm, Porosity: Medium, Particle retention: 10um, Flow rate: Medium Fast, For retention of zirconium hydroxide, aluminum hydroxide, cobalt sulfide, and other coarse or gelatinous precipitates
Catalog Number: CA28306-153
Supplier: VWR International

Certificates


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