Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Supplier: Thermo Scientific Chemicals
Synonyms:
Silicon(IV) oxide
, Silicium (IV) oxide
, Silicium dioxide
41096-KS
41096-KS
CAAA41096-KSEA
366.56
CAD
CAAA41096-KS
AA41096-KS
Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Silicium dioxide
Applications: Magnetron sputtering source
Formula:
SiO₂ MW: 60.08 g/mol Boiling Pt: 2230 °C (1013 hPa) Melting Pt: 1719 °C Density: 2.2 g/cm³ (20 °C) |
MDL Number:
MFCD00011232 CAS Number: 7631-86-9 Merck Index: 14,08493 |
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