Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)

Supplier: Thermo Scientific Chemicals

Synonyms: Silicon(IV) oxideSilicium (IV) oxideSilicium dioxide

41096-KS 41096-KS
CAAA41096-KSEA 366.56 CAD
CAAA41096-KS AA41096-KS
Silicon dioxide ≥99.995% (metals basis), sputtering target, Ø 50.8 mm (2.0 in), Thickness: 3.18 mm (0.125 in)
Silicium dioxide

Applications: Magnetron sputtering source

Formula: SiO₂
MW: 60.08 g/mol
Boiling Pt: 2230 °C (1013 hPa)
Melting Pt: 1719 °C
Density: 2.2 g/cm³ (20 °C)
MDL Number: MFCD00011232
CAS Number: 7631-86-9
Merck Index: 14,08493

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