Buffered oxide etch (20:1) VLSI, with surfactant, J.T.Baker®

Supplier: AVANTOR PERFORMANCE MATERIAL LLC
Danger


Management of Change (MOC) category = R

5568-03 BAKR5568-03
CAJT5568-3CS 828.46 CAD
CAJT5568-3 JT5568-3
Buffered oxide etch (20:1) VLSI, with surfactant, J.T.Baker®
Buffered oxide etch

In the Avantor Electronic Materials range, we have solvents, acids and bases in CMOS and Finyte/VLSI quality, as well as Performance Materials like photoresist- and residue-removers, selective etchants, BEOL and FEOL.
Avantor Performance Materials portfolio of production-proven chemistries , customizable chemistry platforms and world-class applications centers are designed to help you meet your process improvement goals faster and speed up your ramp time to the next node.

UN: 2922
ADR: 8 (6.1),II

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Specification Test Results

For Microelectronic Use
Ship and store material above 35°F (2°C)
Ammonium Fluoride (NH₄F)(w/w) 37.5 - 38.5 %
Hydrofluoric Acid (HF)(w/w) 2.32 - 2.52 %
Residue after Ignition ≤10 ppm
Trace Impurities - Aluminum (Al) ≤200.0 ppb
Arsenic and Antimony (as As) ≤30.0 ppb
Trace Impurities - Barium (Ba) ≤1000.0 ppb
Trace Impurities - Boron (B) ≤200.0 ppb
Trace Impurities - Cadmium (Cd) ≤500.0 ppb
Trace Impurities - Calcium (Ca) ≤200.0 ppb
Trace Impurities - Chromium (Cr) ≤100.0 ppb
Trace Impurities - Cobalt (Co) ≤500.0 ppb
Trace Impurities - Copper (Cu) ≤100.0 ppb
Trace Impurities - Gallium (Ga) ≤500.0 ppb
Trace Impurities - Germanium (Ge) ≤500.0 ppb
Trace Impurities - Gold (Au) ≤300.0 ppb
Heavy Metals (as Pb) ≤1000.0 ppb
Trace Impurities - Iron (Fe) ≤200.0 ppb
Trace Impurities - Lead (Pb) ≤300.0 ppb
Trace Impurities - Lithium (Li) ≤1000.0 ppb
Trace Impurities - Magnesium (Mg) ≤200.0 ppb
Trace Impurities - Manganese (Mn) ≤200.0 ppb
Trace Impurities - Nickel (Ni) ≤200.0 ppb
Trace Impurities - Potassium (K) ≤300.0 ppb
Trace Impurities - Silver (Ag) ≤500.0 ppb
Trace Impurities - Sodium (Na) ≤300 ppb
Trace Impurities - Strontium (Sr) ≤1000.0 ppb
Trace Impurities - Tin (Sn) ≤300.0 ppb
Trace Impurities - Titanium (Ti) ≤300.0 ppb
Trace Impurities - Zinc (Zn) ≤300.0 ppb
Particle Count - 1.0 µm and greater ≤25 par/ml
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