Hydrogen peroxide 30% stabilized, CMOS for the electronics industry, J.T.Baker®
Supplier: AVANTOR PERFORMANCE MATERIAL LLC
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Management of Change (MOC) category = R
BAKR2200-07
BAKR2200-09
2200-10
2200-AN
2200-2J
BAKR2200-2J
BAKR2200-AN
2200-07
BAKR2200-10
2200-09
CAJT2200-9EA
2409.72
CAD
CAJT2200-9
CAJT2200-AN
CAJT2200-10
JT2200-2J
CAJT2200-7
JT2200-9
CAJT2200-2J
JT2200-10
JT2200-7
JT2200-AN
Hydrogen peroxide 30% stabilized, CMOS for the electronics industry, J.T.Baker®
Hydrogen peroxide
Formula:
H₂O₂ MW: 34.01 g/mol Boiling Pt: ∼107 °C (1013 hPa) Melting Pt: < 0 °C Density: 1.11 g/cm³ (20 °C) |
MDL Number:
MFCD00011333 CAS Number: 7722-84-1 UN: 2014 ADR: 5.1,II |
Specification Test Results
For Microelectronic Use | |
Assay (H₂O₂) | 30.0 - 32.0 % |
Color (APHA) | ≤ 10 |
Free Acid (µeq/g) | ≤ 0.2 |
Residue after Evaporation | ≤ 10 ppm |
Ammonium (NH₄) | ≤ 3 ppm |
Chloride (Cl) | ≤ 0.2 ppm |
Nitrate (NO₃) | ≤ 2 ppm |
Phosphate (PO₄) | ≤ 1 ppm |
Sulfate (SO₄) | ≤ 3 ppm |
Trace Impurities - Aluminum (Al) | ≤ 70.0 ppb |
Trace Impurities - Antimony (Sb) | ≤ 10.0 ppb |
Trace Impurities - Arsenic (As) | ≤ 10.0 ppb |
Arsenic and Antimony (as As) | ≤ 10.0 ppb |
Trace Impurities - Barium (Ba) | ≤ 20.0 ppb |
Trace Impurities - Beryllium (Be) | ≤ 10.0 ppb |
Trace Impurities - Bismuth (Bi) | ≤ 20.0 ppb |
Trace Impurities - Boron (B) | ≤ 10.0 ppb |
Trace Impurities - Cadmium (Cd) | ≤ 10.0 ppb |
Trace Impurities - Calcium (Ca) | ≤ 50.0 ppb |
Trace Impurities - Chromium (Cr) | ≤ 20.0 ppb |
Trace Impurities - Cobalt (Co) | ≤ 10.0 ppb |
Trace Impurities - Copper (Cu) | ≤ 10.0 ppb |
Trace Impurities - Gallium (Ga) | ≤ 20.0 ppb |
Trace Impurities - Germanium (Ge) | ≤ 10.0 ppb |
Trace Impurities - Gold (Au) | ≤ 10.0 ppb |
Heavy Metals (as Pb) | ≤ 500.0 ppb |
Trace Impurities - Iron (Fe) | ≤ 50.0 ppb |
Trace Impurities - Lead (Pb) | ≤ 10.0 ppb |
Trace Impurities - Lithium (Li) | ≤ 10.0 ppb |
Trace Impurities - Magnesium (Mg) | ≤ 10.0 ppb |
Trace Impurities - Manganese (Mn) | ≤ 10.0 ppb |
Trace Impurities - Molybdenum (Mo) | ≤ 10.0 ppb |
Trace Impurities - Nickel (Ni) | ≤ 10.0 ppb |
Trace Impurities - Niobium (Nb) | ≤ 10.0 ppb |
Trace Impurities - Potassium (K) | ≤ 600.0 ppb |
Trace Impurities - Silicon (Si) | ≤ 100.0 ppb |
Trace Impurities - Silver (Ag) | ≤ 10.0 ppb |
Trace Impurities - Sodium (Na) | ≤ 100.0 ppb |
Trace Impurities - Strontium (Sr) | ≤ 10.0 ppb |
Trace Impurities - Tantalum (Ta) | ≤ 10.0 ppb |
Trace Impurities - Thallium (Tl) | ≤ 50.0 ppb |
Trace Impurities - Tin (Sn) | 190.0 - 500.0 ppb |
Trace Impurities - Titanium (Ti) | ≤ 10.0 ppb |
Trace Impurities - Vanadium (V) | ≤ 10.0 ppb |
Particle Count - 0.2 µm and greater | ≤ 1175 par/ml |
Trace Impurities - Zinc (Zn) | ≤ 50 ppb |
Trace Impurities - Zirconium (Zr) | ≤ 10.0 ppb |
Particle Count at point of fill - 0.5 µm and greater | ≤ 100 par/ml |
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